to your skin.
Aftersun face mask that soothes skin stressed by sun exposure and encourages a deeper, longer-lasting tan.
• 3-molecular weight hyaluronic acid (3-LURONICS technology) curbs trans epidermical dehydration and stimulates collagen and elastin production.
• active ingredients Chamomile and Oat repair skin and reduce redness.
Enhances skin radiance.
THE RESULT: +16% of hydration on the first application and brighter skin in 95% of subjects in 2 months.
*Clinical and instrumental tests conducted by a dermatologist on 20 subjects
How to use
1. apply the mask to clean and dry face.
2. Leave on for 15 minutes.
3. Delicately massage in excess product until completely absorbed.